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PREVAIL Alpha Tool
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| Thu Mar 16, 2000 | 10:00P| PermaLink |
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PREVAIL, for Projection Reduction Exposure With Variable Axis Immersion Lenses. Nikon and IBM have recently joined forces to build an electron beam based lithography machine for chip manufacturing. A demo chip was made to 0.08 micron recently to prove the tech which is now being developed further by nikon and IBM which may be completed by 2002.
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FULL STORY @
ZDNET
(http://www.zdnet.com/zdnn/stories/news/0,4586,2453929,00.html)
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